Innosys can supply fully refurbished systems and chambers for PVD, CVD and etch applications on Endura, Centura, Producer and P-5000 platforms. Below is a partial list of the processes and chamber configurations supported by Innosys.  
 
      Standard Aluminum (Al)
      Planarized Hot Aluminum
      Hot Aluminum High Temp High Uniformity
      Standard Titanium (Ti)
      Titanium Nitride (TiN)
      Coherent Titanium (Co-Ti)
      Titanium Coherent Titanium / Titanium Nitride.
      Cobalt
      Titanium / Titanium Nitride (TTN)
 
 
 
      150mm - 200mm size
      Wide or Narrow Body Load Locks
      Standard or Extended System Controller
      Through-the-Wall, Ballroom Style or SMIF Interface
      HP, HP+ or VHP Robots
      Fast Wafer Mapping
      Buffer / Transfer Lid Hoist
      Cool Down, Pass-Thru Orienters
 
      Standard Body Chamber
      Wide Body PVD Chamber
      Standard Body Water Cooled PVD Chamber
      Paste Chamber (Ch-5)
      Preclean I / II chamber
      Orienter / Degas Chamber
      PVD High Temp Degas Chamber
      Copper Barrier Seed
 
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