Innosys can supply fully refurbished systems and chambers for PVD, CVD and etch applications on Endura, Centura, Producer and P-5000 platforms. Below is a partial list of the processes and chamber configurations supported by Innosys.  
 
      TEOS, Silane Oxide/Nitride
      Tungsten CVD, WSiX
      Sputter Oxide, Poly or Metal Etch
      Strip
      Sputter Oxide, Poly or Metal Etch
      RTP/RTA
      IPS Dielectric Etch
      High Densitiy Plasma Dielectric Etch
      Titanium Tungsten (TiW)
      DPS
 
 
 
      150mm - 200mm size
      Wide or Narrow Body Load Locks
      Standard or Extended System Controller
      Through-the-Wall, Ballroom Style or SMIF Interface
      HP, HP+ or VHP Robots
      Fast Wafer Mapping
      Buffer / Transfer Lid Hoist
      Cool Down, Pass-Thru Orienters
      208Vac, 50 or 60Hz top feed or bottom
      Single or Dual Orienter
 
      DxZ Chamber
      WxZ, WxL
      MxP, MxP+
      ASP, PRSP
      eMxP+
      Radiance
      IPS
      Ultima, Ultima Plus, Ultima X
      TxZ
      DPS, DPS+
 
Top of page
 
2345 Bering Drive, San Jose, CA, 95131 Tel: 408.324.0385 Fax: 408.324.0390
© 2007 Innosys Technologies Inc. All rights reserved.
Home | About Us | Products | Spare Parts | Services | Contact Us